Enhancement of device characteristics of CNT-TFET: Role of electrostatic doping and work function engineering
dc.Affiliation | October University for modern sciences and Arts (MSA) | |
dc.contributor.author | Ossaimee, Mahmoud | |
dc.contributor.author | Salah, Ahmed | |
dc.contributor.author | Gamal, Salah H | |
dc.contributor.author | Shaker, Ahmed | |
dc.contributor.author | Salem, M.S | |
dc.date.accessioned | 2022-06-10T11:09:03Z | |
dc.date.available | 2022-06-10T11:09:03Z | |
dc.date.issued | 07/06/2022 | |
dc.description.abstract | In this work, an Electrostatic Doped Carbon Nanotube Tunneling FET (ED CNT-TFET) has been designed and simulated using a work function engineering technique. An intrinsic CNT is introduced as a channel material and a doped pocket is created between the source and the channel by utilizing an appropriate work function to boost the ON-state current of the device. Moreover, dielectric pocket engineering is applied to boost the high-frequency performance. The simulations, performed in this work, are conducted through a 2D solution of Poisson and Schrodinger equations which are done by utilizing the unbalanced Green function formalism. Simulation results demonstrate that the proposed device structure could improve the ON-current, cut-off frequency, and achieve a low subthreshold swing (SS) value which makes it suitable for low power applications. Additionally, the presented structure could also eliminate ambipolar conduction. | en_US |
dc.description.uri | https://www.scimagojr.com/journalsearch.php?q=19700200705&tip=sid&clean=0 | |
dc.identifier.doi | https://doi.org/10.1016/j.asej.2022.101848 | |
dc.identifier.other | https://doi.org/10.1016/j.asej.2022.101848 | |
dc.identifier.uri | http://repository.msa.edu.eg/xmlui/handle/123456789/4961 | |
dc.language.iso | en_US | en_US |
dc.publisher | Ain Shams University | en_US |
dc.relation.ispartofseries | Ain Shams Engineering Journal; | |
dc.subject | Tunneling | en_US |
dc.subject | CNT | en_US |
dc.subject | TFET | en_US |
dc.subject | Electrostatic Doping | en_US |
dc.subject | Work function engineering | en_US |
dc.subject | Dielectric engineering | en_US |
dc.title | Enhancement of device characteristics of CNT-TFET: Role of electrostatic doping and work function engineering | en_US |
dc.type | Article | en_US |