Enhancement of device characteristics of CNT-TFET: Role of electrostatic doping and work function engineering

dc.AffiliationOctober University for modern sciences and Arts (MSA)
dc.contributor.authorOssaimee, Mahmoud
dc.contributor.authorSalah, Ahmed
dc.contributor.authorGamal, Salah H
dc.contributor.authorShaker, Ahmed
dc.contributor.authorSalem, M.S
dc.date.accessioned2022-06-10T11:09:03Z
dc.date.available2022-06-10T11:09:03Z
dc.date.issued07/06/2022
dc.description.abstractIn this work, an Electrostatic Doped Carbon Nanotube Tunneling FET (ED CNT-TFET) has been designed and simulated using a work function engineering technique. An intrinsic CNT is introduced as a channel material and a doped pocket is created between the source and the channel by utilizing an appropriate work function to boost the ON-state current of the device. Moreover, dielectric pocket engineering is applied to boost the high-frequency performance. The simulations, performed in this work, are conducted through a 2D solution of Poisson and Schrodinger equations which are done by utilizing the unbalanced Green function formalism. Simulation results demonstrate that the proposed device structure could improve the ON-current, cut-off frequency, and achieve a low subthreshold swing (SS) value which makes it suitable for low power applications. Additionally, the presented structure could also eliminate ambipolar conduction.en_US
dc.description.urihttps://www.scimagojr.com/journalsearch.php?q=19700200705&tip=sid&clean=0
dc.identifier.doihttps://doi.org/10.1016/j.asej.2022.101848
dc.identifier.otherhttps://doi.org/10.1016/j.asej.2022.101848
dc.identifier.urihttp://repository.msa.edu.eg/xmlui/handle/123456789/4961
dc.language.isoen_USen_US
dc.publisherAin Shams Universityen_US
dc.relation.ispartofseriesAin Shams Engineering Journal;
dc.subjectTunnelingen_US
dc.subjectCNTen_US
dc.subjectTFETen_US
dc.subjectElectrostatic Dopingen_US
dc.subjectWork function engineeringen_US
dc.subjectDielectric engineeringen_US
dc.titleEnhancement of device characteristics of CNT-TFET: Role of electrostatic doping and work function engineeringen_US
dc.typeArticleen_US

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